Sputter coating is the standard method for preparing non-conducting or poorly conducting specimens prior to observation in a scanning electron microscope (SEM). Quorum offer low-cost, rotary-pumped sputter coaters for depositing non-oxidising metals - such as gold (Au) and platinum (Pt) - and turbomolecular-pumped coaters, suitable for both oxidising and non-oxidising metals, such as chromium (Cr).

The PP3010 is a highly automated, easy to use, column-mounted, gas-cooled cryo preparation system suitable for most makes and models of SEM, FE-SEM and FIB/SEM.

The TPX3Cam is a fast optical camera for time stamping of optical photons. It is based on a new silicon pixel sensor, which in combination with the Timepix3 ASIC and readout, is suitable for a wide range of applications which require time-resolved imaging of electrons, ions or single photons. The TPX3Cam can be easily integrated both in tabletop lab setups, as in synchrotron or free-electron-laser environments.

ASI’s Chee-tah is a hybrid pixel detector suitable for electron microscope applications. The Chee-tah’s sensitivity and speed offers unprecedented possibilities for electron diffraction, imaging and tomography.Each pixel is connected via bump-bonds to the readout electronics integrated in the chip below the sensor. The electronics in a pixel processes the signals from the sensor. An individual pixel counts the number of detected events in the corresponding area.Scintillated detectors don’t have the signal to noise ratio’s that can be obtained with the Chee-tah. Other direct electron cameras lack the dynamic range the Chee-tah has and are often too beam sensitive to be used for diffraction experiments. The Chee-tah’s high speed makes it ideal for looking at dynamic processes and catching fast fading signals.

MICROTEST 2kN & 5kN modules have been specifically designed to allow real time observation of the high stress region of a sample with an SEM, optical microscope, AFM or XRD system. Windows 7.0/10.0 software sets drive parameters and displays the stress/strain curve live on the computer screen. Loadcells from 150N to 5kN cover most applications, with extension rates from 0.005mm/min to 50mm/min. All stages have linear scales for elongation measurement and optical encoders for speed control. Options include three and four point bending clamps, fibre clamps and microscope mounting adaptors. Modules are controlled from Microtest tensile testing software and special versions can be manufactured to customers requirements.

The Nanometer Pattern Generation System is the top selling SEM lithography system at research institutions in North America and its use has become widespread around the world. The objective for NPGS is to provide a powerful, versatile, and easy to use system for doing advanced electron beam lithography or ion beam lithography using a commercial SEM (Scanning Electron Microscope), STEM (Scanning Transmission Electron Microscope), FIB (Focused Ion Beam), dual beam (SEM/FIB), or Helium Ion microscope(HIM).

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1x10-6mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging. The lower background pressure removes oxygen nitrogen and water vapour from the chamber, avoiding chemical reactions during the sputter process, which could otherwise lead to impurities or defects in the coatings. Similarly, lower scattering allows for high purity, amorphous carbon films of high density. The Q150V Plus offers all the benefits of the Q150T Plus, but with a finer grain size and thinner coating, for ultra-high-resolution applications (above x 200,000 magnification).

The Q150T Plus is optimised for use with a turbomolecular pump, which gives a lower vacuum down to 5 x 10-5 mbar. This enables the sputtering of oxidising metals, which have a lower grain size suitable for high-resolution imaging. Similarly, lower scattering allows for high purity, amorphous carbon films of high density.

The Q150R Plus is suitable for use with Tungsten/LaB6 SEM and Benchtop SEM. Typical uses: Sputter coating of noble metals using the Q150R S & ES Plus: Recommended for magnifications: •   up to x 50k using Au, Au/Pd •   up to x 100k using Pt (optional) Carbon cord coating for elemental analysis using the Q150R E & ES Plus.

Suitable for multi-layer sequential sputtering of two materials, the Q300T D Plus has two independent sputtering heads, which allows sequential sputtering of two metals without the need to break vacuum. The system is fully automated with user defined recipes controlling the pumping sequence, time, number of sputter cycles, and the current used during the process. Unlimited layers of varying thickness from two target materials can be sputtered sequentially by cycling between both targets. When not in use the targets are shuttered for protection from contamination.

The SC7620 is a compact entry-level SEM sputter coater. When combined with the optional SC7620-CF carbon fibre evaporation attachment it makes the ideal low-cost SEM sputtering and carbon coating system package. Additionally, the SC7620 is fitted as standard with a glow discharge function, making it suitable for the hydrophilisation (or ’wetting’) of carbon-coated TEM grids and for other surface modifications.

For SEM, FIB, TEM, XPS, ALD , CD-SEM, EBR, EBI, EUVL and other high vacuum system. Remote plasma source should be installed on the vacuum chamber to be cleaned. Controller provides the RF power to the remote plasma source. RF energy breaks down the process gas that contains oxygen, hydrogen or other process gases and generates reactive radicals. Radical species will then diffuse into the chamber to be cleaned and react with the contaminants. The byproducts are usually low molecule weight, high vapor pressure molecules that can be easily pumped away. Remote plasma cleaner can clean vacuum systems and samples at the same time.

The multipurpose chamber can be configured for different applications with exter-nal accessories such as EM-KLEEN remote plasma source and/or TEM specimen holder adapters. EM-KLEEN remote plasma source can be used to generate oxygen & hydrogen radicals using air, O2, or H2 gas for sample cleaning and surface activa-tion. If the chamber is equipped with TEM specimen holder adapters, it can accept a total of six TEM specimen holders from Thermo-Fisher, JEOL, and Hitachi. Then it can be used as a vacuum storage station. Of course, EM-KLEEN plasma source can also be taken out and installed on a separate SEM, FIB or XPS chambers.

Micro to Nano is a company specialised in innovative, practical and useful microscopy supplies for electron microscopy and scanning probe microscopy techniques. With a combined experience of over 50 years in electron microscopy, sample preparation, imaging technology and product distribution. M2N have a deep understanding of the needs of customers.