For SEM, FIB, TEM, XPS, ALD , CD-SEM, EBR, EBI, EUVL and other high vacuum system. Remote plasma source should be installed on the vacuum chamber to be cleaned. Controller provides the RF power to the remote plasma source. RF energy breaks down the process gas that contains oxygen, hydrogen or other process gases and generates reactive radicals. Radical species will then diffuse into the chamber to be cleaned and react with the contaminants. The byproducts are usually low molecule weight, high vapor pressure molecules that can be easily pumped away. Remote plasma cleaner can clean vacuum systems and samples at the same time.

The multipurpose chamber can be configured for different applications with exter-nal accessories such as EM-KLEEN remote plasma source and/or TEM specimen holder adapters. EM-KLEEN remote plasma source can be used to generate oxygen & hydrogen radicals using air, O2, or H2 gas for sample cleaning and surface activa-tion. If the chamber is equipped with TEM specimen holder adapters, it can accept a total of six TEM specimen holders from Thermo-Fisher, JEOL, and Hitachi. Then it can be used as a vacuum storage station. Of course, EM-KLEEN plasma source can also be taken out and installed on a separate SEM, FIB or XPS chambers.