Sputter coating is the standard method for preparing non-conducting or poorly conducting specimens prior to observation in a scanning electron microscope (SEM). Quorum offer low-cost, rotary-pumped sputter coaters for depositing non-oxidising metals - such as gold (Au) and platinum (Pt) - and turbomolecular-pumped coaters, suitable for both oxidising and non-oxidising metals, such as chromium (Cr).

The PP3010 is a highly automated, easy to use, column-mounted, gas-cooled cryo preparation system suitable for most makes and models of SEM, FE-SEM and FIB/SEM.

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1x10-6mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging. The lower background pressure removes oxygen nitrogen and water vapour from the chamber, avoiding chemical reactions during the sputter process, which could otherwise lead to impurities or defects in the coatings. Similarly, lower scattering allows for high purity, amorphous carbon films of high density. The Q150V Plus offers all the benefits of the Q150T Plus, but with a finer grain size and thinner coating, for ultra-high-resolution applications (above x 200,000 magnification).

The Q150T Plus is optimised for use with a turbomolecular pump, which gives a lower vacuum down to 5 x 10-5 mbar. This enables the sputtering of oxidising metals, which have a lower grain size suitable for high-resolution imaging. Similarly, lower scattering allows for high purity, amorphous carbon films of high density.

The Q150R Plus is suitable for use with Tungsten/LaB6 SEM and Benchtop SEM. Typical uses: Sputter coating of noble metals using the Q150R S & ES Plus: Recommended for magnifications: •   up to x 50k using Au, Au/Pd •   up to x 100k using Pt (optional) Carbon cord coating for elemental analysis using the Q150R E & ES Plus.

Suitable for multi-layer sequential sputtering of two materials, the Q300T D Plus has two independent sputtering heads, which allows sequential sputtering of two metals without the need to break vacuum. The system is fully automated with user defined recipes controlling the pumping sequence, time, number of sputter cycles, and the current used during the process. Unlimited layers of varying thickness from two target materials can be sputtered sequentially by cycling between both targets. When not in use the targets are shuttered for protection from contamination.

The SC7620 is a compact entry-level SEM sputter coater. When combined with the optional SC7620-CF carbon fibre evaporation attachment it makes the ideal low-cost SEM sputtering and carbon coating system package. Additionally, the SC7620 is fitted as standard with a glow discharge function, making it suitable for the hydrophilisation (or ’wetting’) of carbon-coated TEM grids and for other surface modifications.

The PP3006 CoolLok offers rapid transfer and cryo temperature observation of specimens for SEM, FIB/SEM, beamline or other vacuum systems. Freezing is on-contact with the pre-cooled SEM or FIB/SEM cold stage, or specimens can be rapidly pre-frozen in slushy liquid nitrogen using the optional freezing station (24425). Applications include thermal protection of beam-sensitive specimens and low temperature observation of materials such as plastics, polymers low-K dielectrics and hard-soft mixtures. The system can also be used for inert gas transfer of ambient temperature specimens from a glove box.

The Q150 GB is a modular glove box version of the highly successful Q150T ES Plus bench top turbomolecular-pumped coating system - suitable for SEM, TEM and many thin-film applications. The Q150 GB comes as standard with sputtering and carbon rod evaporation inserts and a rotating specimen stage. Options include metal evaporation, glow discharge, film thickness measurement and special stages to suit a range of specimen types.

The Q300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 8"/200mm or multiple smaller specimens over a similar diameter. Ideal for thin-film applications and SEM/FE-SEM. It is fitted with three sputtering heads to ensure even deposition of individual large specimens or multiple specimens. The Q300T T Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidising and noble metals. Fitted with three 57mm Ø x 0.3 mm chromium (Cr) sputtering targets as standard. Other targets options include; Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al etc.

Based on the successful Q Series of sputter/carbon coaters, the Q300T ES Plus is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens or smaller multiple specimens. The Q300T ES also comes with interchangeable sputtering and carbon evaporation inserts.

The K975X is a compact, bench-mounted, multiple application thermal evaporator for vacuum deposition of thin layers of carbon and metals. It is ideal for a wide range of techniques, including the production of carbon support films and replicas for TEM and carbon/metal thin film applications. The K975X is available with a wide range of optional add-ons, including low-angle shadowing and sequential layer coating using dual-source evaporation (an additional metal evaporation source is required). K975S Carbon Evaporator for 8” wafers. The K975S is similar to the K975X, but designed to coat an 8” wafer or similarly large specimen with carbon.

The QuickLok provides a rapid way of transferring ambient temperature specimens into SEM, FIB/SEM or other suitable vacuum systems. A key feature of the QuickLok is the ability to vacuum transfer specimens that are sensitive to normal environmental conditions. The transfer device uses a sealed vacuum chamber which can be interfaced to a glove box for inert gas transfer or can allow transfer to and from a range of vacuum platforms.

The GloQube® Plus is a cost-effective, compact and easy to use glow discharge system, designed to fulfil the needs of laboratories with TEM. The primary application of the GloQube® Plus is to modify the surface of TEM grids in a way that it meets requirements for successful imaging of a variety of macromolecules. Integrated into one system, the two chambers enable the user maximum flexibility to choose which sample preparation technique they want to use: glow discharge in-air or in-chemical vapour, without downtime for cleaning or the risk of contamination and loss of samples. The in-chemical vapour glow discharge doesn’t just help with retaining molecules on the TEM grids, but it also allows the user to control the orientation and conformation. With automatic vapour control, the system ensures accurate concentrations of chemical vapour in the plasma, producing reliable and reproducible results. Two chambers designed into one easy to use package provides a smaller footprint for the workflow space and no cross-contamination between the chambers.

The K1050X is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications.