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GloQube® Plus Glow Discharge System for TEM Grids and surface modification

GloQube® Plus Glow Discharge System for TEM Grids and surface modification

The GloQube® Plus is a cost-effective, compact and easy to use glow discharge system, designed to fulfil the needs of laboratories with TEM. The primary application of the GloQube® Plus is to modify the surface of TEM grids in a way that it meets requirements for successful imaging of a variety of macromolecules. Integrated into one system, the two chambers enable the user maximum flexibility to choose which sample preparation technique they want to use: glow discharge in-air or in-chemical vapour, without downtime for cleaning or the risk of contamination and loss of samples. The in-chemical vapour glow discharge doesn’t just help with retaining molecules on the TEM grids, but it also allows the user to control the orientation and conformation. With automatic vapour control, the system ensures accurate concentrations of chemical vapour in the plasma, producing reliable and reproducible results. Two chambers designed into one easy to use package provides a smaller footprint for the workflow space and no cross-contamination between the chambers.
K1050X RF Plasma Etcher/Asher/Cleaner

K1050X RF Plasma Etcher/Asher/Cleaner

The K1050X is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications.
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Nanjing Tansi Technology Co.,Ltd.

FAX:025-83353938

ZIP: 210009

ADD:2-728b, Hongqiao center, new City Plaza, 281 Zhongshan North Road, Nanjing

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