Multipurpose Chamber——TEM & SEM sample cleaning & storage solution

The multipurpose chamber can be configured for different applications with exter-nal accessories such as EM-KLEEN remote plasma source and/or TEM specimen holder adapters. EM-KLEEN remote plasma source can be used to generate oxygen & hydrogen radicals using air, O2, or H2 gas for sample cleaning and surface activa-tion. If the chamber is equipped with TEM specimen holder adapters, it can accept a total of six TEM specimen holders from Thermo-Fisher, JEOL, and Hitachi. Then it can be used as a vacuum storage station. Of course, EM-KLEEN plasma source can also be taken out and installed on a separate SEM, FIB or XPS chambers.

Product model:

Product description

Parameters

The multipurpose chamber can be configured for different applications with exter-nal accessories such as EM-KLEEN remote plasma source and/or TEM specimen holder adapters. EM-KLEEN remote plasma source can be used to generate oxygen & hydrogen radicals using air, O2, or H2 gas for sample cleaning and surface activa-tion. If the chamber is equipped with TEM specimen holder adapters, it can accept a total of six TEM specimen holders from Thermo-Fisher, JEOL, and Hitachi. Then it can be used as a vacuum storage station. Of course, EM-KLEEN plasma source can also be taken out and installed on a separate SEM, FIB or XPS chambers.

Multipurpose_Chamber_source+chamber_side_view

Configuration 1

EM-KLEEN plasma source on the multipurpose chamber.

Applications: EM-KLEEN remote plasma source generates oxygen or hydrogen radicals using room air, oxygen, or Hydrogen as the process gas. Sample can be loaded from the top glass door. EM-KLEEN plasma source can also be taken out and installed on a separate SEM, FIB & XPS system chamber for chamber clean-ing.